Method for manufacturing detecting element, method for manufacturing imaging device, detecting element, imaging device, and electronic device

ABSTRACT

A detecting element has an absorbing section where a temperature rises according to an amount of electromagnetic waves which are absorbed and a detecting section where characteristics change according to an amount of heat which is transmitted from the absorbing section. A method for manufacturing the detecting element includes: forming the detecting section on a substrate; forming a protective film which covers the detecting section; forming a hollow space portion in a region which overlaps with the detecting section of the substrate in a planar view after the forming of the protective film; and forming the absorbing section by applying a liquid body, which contains a material constituting the absorbing section, in a region on the protective film on an opposite side from the detection section, which overlaps with the detecting section in a planar view, and solidifying the liquid body after the forming of the hollow space portion.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority to Japanese Patent Application No.2012-083626 filed on Apr. 2, 2012. The entire disclosure of JapanesePatent Application No. 2012-083626 is hereby incorporated herein byreference.

BACKGROUND

1. Technical Field

The present invention relates to a method for manufacturing a detectingelement, a method for manufacturing an imaging device, a detectingelement, an imaging device, an electronic device, and the like.

2. Related Art

In the past, pyroelectric detecting elements have been known as oneexample of a detecting element (for example, refer to Japanese Laid-OpenPatent Application Publication No. 2011-203168).

SUMMARY

In the detecting element described in the publication described above,it is possible to detect infrared rays which are one type ofelectromagnetic wave. In the detecting element, an infrared rayabsorbing body emits heat due to the infrared absorber absorbinginfrared rays and it is possible to detect infrared rays based onchanges in the amount of polarization of a capacitor due to heat.

In such pyroelectric detecting elements, it is preferable that thethickness of the absorbing body which absorbs electromagnetic waves bethick from the point of view of increasing the absorption rate of theelectromagnetic waves. However, when the thickness of the absorbing bodyis increased, it is difficult to secure the thickness of the protectivefilm which covers the absorbing body in order to protect the absorbingbody. In other words, when the thickness of the absorbing body isincreased, it is easy for the step coverage of the protective film whichcovers the absorbing body to decrease. When the step coverage decreases,it is easy for the function of protecting the absorbing body to bedecreased. As a result, it is easy for productivity and reliability ofthe detecting element to decrease.

That is, in detecting elements in the related art, there is a problem inthat it is difficult to improve productivity and reliability.

The present invention has been made to address at least part of thecircumstances described above, and it is possible for the presentinvention to be achieved as embodiments or application examplesdescribed below.

A method according to one aspect is a method for manufacturing adetecting element, which has an absorbing section where a temperaturerises according to an amount of electromagnetic waves which are absorbedand a detecting section where characteristics change according to anamount of heat which is transmitted from the absorbing section. Themethod includes: forming the detecting section on a substrate; forming aprotective film which covers the detecting section; forming a hollowspace portion in a region which overlaps with the detecting section ofthe substrate in a planar view after the forming of the protective film;and forming the absorbing section by applying a liquid body, whichcontains a material constituting the absorbing section, in a region onthe protective film on an opposite side from the detection section,which overlaps with the detecting section in a planar view, andsolidifying the liquid body after the forming of the hollow spaceportion.

In the method for manufacturing of the detecting element of this aspect,since the absorbing section is formed after the hollow space portion isformed, it is possible to avoid damaging the absorbing section due tothe forming of the hollow space portion. As a result, it is possible toomit the film which protects the absorbing section. As a result, it ispossible to easily improve the productivity and reliability of thedetecting element.

In the method for manufacturing the detecting element described above,the forming of the absorbing section preferably includes applying theliquid body by discharging the liquid body as liquid droplets.

In this aspect, a method is adopted in the forming of the absorbingsection where a liquid body is applied by discharging the liquid body asliquid droplets. In this method, it is easy for the liquid body to bepatterned with high precision. As a result, according to this method formanufacturing of the detecting element, it is possible for it to be easyto arrange the absorbing body with high precision.

In the method for manufacturing the detecting element described above,the forming of the detecting section preferably includes forming a firstelectrode on the substrate, forming a pyroelectric body on the firstelectrode on an opposite side from the substrate, and forming a secondelectrode on the pyroelectric body on an opposite side from the firstelectrode.

In this aspect, it is possible to manufacture a detecting element whichhas a configuration where a pyroelectric body is interposed between thefirst electrode and the second electrode which face each other.

The method for manufacturing the detecting element described abovepreferably further includes forming a sacrificial layer on the substratebefore the forming of the detecting section. The forming of thedetecting section preferably includes forming the detecting section in aregion which overlaps with the sacrificial layer of the substrate in aplanar view, and the forming of the hollow space portion includesforming the hollow space portion by removing the sacrificial layer.

In this aspect, since the sacrificial layer is removed after thedetecting section is formed in a region which overlaps with thesacrificial layer, it is possible to easily form the hollow spaceportion.

In the method for manufacturing the detecting element described above,the forming of the hollow space portion preferably includes forming ahole which reaches the sacrificial layer in the surroundings of thedetecting section, and supplying an etchant from the hole and removingthe sacrificial layer.

In this aspect, it is possible to remove the sacrificial layer bysupplying the etchant from the hole which reaches the sacrificial layer.In this manufacturing method, it is possible to form the hollow spaceportion by etching. Then, according to this manufacturing method for thedetecting element, it is possible to avoid damaging the absorbingsection due to the etching in the forming of the hollow space portion.In addition, according to this manufacturing method, it is possible forit to be easy to avoid the liquid body which coats the protective filmflowing into the hollow space portion in the forming of the absorbingsection.

A method for manufacturing an imaging device according to another aspectincludes arranging a plurality of the detecting elements in bi-axialdirections using the method for manufacturing the detecting elementdescribed above.

In the manufacturing method for the imaging device of this aspect, sincethe absorbing section is formed after the hollow space portion is formedin the manufacturing of the detecting element, it is possible to avoiddamaging the absorbing section due to the forming of the hollow spaceportion. As a result, it is possible to omit the film which protects theabsorbing section. As a result, it is possible to manufacture an imagingdevice where it is possible for it to be easy to improve theproductivity and reliability of the detecting element.

A detecting element according to another aspect includes a substrate, adetecting section, a wiring layer, a protective film, an absorbingsection and a hollow space portion. The detecting section is provided onthe substrate, characteristics of the detecting section being changedaccording to transfer of heat. The wiring layer is provided on thedetecting section on an opposite side from the substrate. The wiringlayer is electrically connected to the detecting section in a regionwhich overlaps with the detecting section in a planar view, and extendsto an outside of the region which overlaps with the detecting section.The protective film is provided on the wiring layer on an opposite sidefrom the detecting section and covering the wiring layer and thedetecting section. The absorbing section is provided at the protectivefilm on an opposite side from the substrate, a temperature of theabsorbing section being configured to rise according to an amount ofelectromagnetic waves which are absorbed. The hollow space portion isprovided in a region which overlaps with the detecting section of thesubstrate in a planar view.

In the detecting element of this aspect, since a configuration isadopted where the absorbing section is provided at the outside of theprotective film which coats the wiring layer and the detecting section,it is possible to form the absorbing section after forming the hollowspace portion. Due to this, it is possible to avoid damaging theabsorbing section in the forming of the hollow space portion. As aresult, it is possible to omit the film which protects the absorbingsection. As a result, it is possible for it to be easy to improve theproductivity and reliability of the detecting element.

An imaging device according to another aspect includes a plurality ofthe detecting elements described above arranged in bi-axial directions.

In the imaging device of this aspect, since the detecting element, whereit is possible for it to be easy to improve the productivity andreliability, is arranged, it is possible for it to be easy to improvethe productivity and reliability of the imaging device.

An electronic device according to another aspect is provided with thedetecting element described above.

Since the electronic device of this aspect has a detecting element whereit is possible for it to be easy to improve the productivity andreliability, it is possible for it to be easy to improve theproductivity and reliability of the electronic device.

An electronic device according to another aspect is provided with theimaging device described above.

Since the electronic device of the aspect has an imaging device where itis possible for it to be easy to improve the productivity andreliability, it is possible for it to be easy to improve theproductivity and reliability of the electronic device.

BRIEF DESCRIPTION OF THE DRAWINGS

Referring now to the attached drawings which form a part of thisoriginal disclosure:

FIG. 1 is a block diagram illustrating main constituent elements of acamera in the present embodiment.

FIG. 2 is a block diagram illustrating main constituent elements of animaging unit in the present embodiment.

FIG. 3 is an equivalent circuit diagram of an imaging device in thepresent embodiment.

FIG. 4 is a planar diagram illustrating a detecting element in thepresent embodiment.

FIG. 5 is a cross sectional diagram along the line A-A in FIG. 4.

FIG. 6 is an enlarged diagram of a B portion in FIG. 5.

FIG. 7 is a cross sectional diagram along the line C-C in FIG. 4.

FIGS. 8A to 8D are diagrams describing a method for manufacturing animaging device in the present embodiment.

FIGS. 9A to 9D are diagrams describing the method for manufacturing animaging device in the present embodiment.

FIGS. 10A to 10C are diagrams describing the method for manufacturing animaging device in the present embodiment.

FIGS. 11A to 11C are diagrams describing the method for manufacturing animaging device in the present embodiment.

FIG. 12 is a diagram describing the method for manufacturing an imagingdevice in the present embodiment.

FIG. 13 is a block diagram illustrating main constituent elements of adriving support device in the present embodiment.

FIG. 14 is a perspective diagram illustrating a vehicle where thedriving support device is mounted in the present embodiment.

FIG. 15 is a block diagram illustrating main constituent elements of asecurity device in the present embodiment.

FIG. 16 is a schematic diagram illustrating a house where the securitydevice is installed in the present embodiment.

FIG. 17 is a schematic diagram illustrating main constituent elements ofa game device in the present embodiment.

FIG. 18 is a block diagram illustrating main constituent elements of acontroller of the game device in the present embodiment.

FIG. 19 is a block diagram illustrating main constituent elements of abody temperature measurement device in the present embodiment.

FIG. 20 is a block diagram illustrating main constituent elements of aspecific substance detecting device in the present embodiment.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Embodiments with a camera, which is one example of an electronic device,as an example will be described with reference to the diagrams.

As shown in FIG. 1, which is a block diagram illustrating mainconstituent elements, a camera 1 in the present embodiment includes anoptical system 3, an imaging unit 5, an image processing section 7, acontrol section 9, a storage section 11, an operation section 13, and adisplay section 15. The image processing section 7, the control section9, the storage section 11, the operation section 13, and the displaysection 15 are connected to each other through a bus 17.

The optical system 3 images an image of an object on an image plane bytaking in electromagnetic waves from the object and collecting theelectromagnetic waves from the object on the image plane.

The imaging unit 5 has an imaging device 19 which is one example of anelectronic device. The imaging device 19 has a plurality of detectingelements which will be described later. The detecting elements detectelectromagnetic waves and output a signal according to the amount of theelectromagnetic waves which are detected. The electromagnetic waves fromthe object which are taken in by the optical system 3 described aboveare imaged as an image in the imaging device 19. The distribution of theamount of electromagnetic waves in the image which was imaged isdetected by the plurality of detecting elements. It is possible for thedistribution of the amount of electromagnetic waves in the image whichwas imaged to be represented as an image.

Here, the imaging unit 5 outputs the distribution of the amount ofelectromagnetic waves in the image which was detected by the imagingdevice 19 to the image processing section 7 as image data VD.

The image processing section 7 performs various types of imageprocessing such as correction processing with regard to the image whichis expressed by the image data VD.

The control section 9 controls the operation of each of the constituentelements in the camera 1.

The storage section 11 stores various types of information. A regionwhich stores the program software where the control procedure of theactions in the camera 1 is written, a region which temporarily developsvarious types of data, and the like, are set in the storage section 11.

The operation section 13 is an interface for an operator to operate thecamera 1 and has various types of input buttons, and the like.

The display section 15 displays an image which is expressed by the imagedata VD.

According to the camera 1 which has the constituent elements describedabove, it is possible to image an object and display the object which isimaged as an image.

Here, in the present embodiment, a detecting element where it ispossible to detect infrared rays which are one type of electromagneticwaves is adopted as the detecting element of the imaging device 19. Dueto this, it is possible to use the camera 1 in thermography, as a nightvision device, and the like.

As shown in FIG. 2 which is a block diagram illustrating the mainconstituent elements, the imaging unit 5 includes the imaging device 19,a selection circuit 21, a read out circuit 23, an A/D conversion section25, and a control circuit 27.

In the imaging device 19, a plurality of detecting elements 31 areprovided. The plurality of detecting elements 31 are arranged in the Xdirection and the Y direction in the diagram. Then, the plurality ofdetecting elements 31 configure a matrix with the X direction as theline direction and the Y direction as the column direction.

In the present embodiment, the plurality of detecting elements 31 whichare lined up along the Y direction configure one element column CL. Inaddition, the plurality of detecting elements 31 which are lined upalong the X direction configure one element line LN.

In the present embodiment, the imaging device 19 has n (n is an integerof one or more) of the element lines LN and m (m is an integer of one ormore) of the element columns CL. That is, in the present embodiment, theplurality of detecting elements 31 configures a matrix of n lines×mcolumns.

Here, below, in a case where n element lines LN are individuallyidentified, the notation of element line LN (i) is used. i is an integerof one or more and n or less. In addition, in a case where m elementcolumns CL are individually identified, the notation of element columnCL (j) is used. j is an integer of one or more and m or less.

Here, as shown in FIG. 3 which is an equivalent circuit diagram, theimaging device 19 has n selection lines T and m signal lines S. The nselection lines T are lined up in the Y direction so as to be spacedfrom each other at intervals. The n selection lines T each extend in theX direction. The m signal lines S are lined up in the X direction so asto be spaced from each other at intervals. The m signal lines S eachextend in the Y direction.

The selection lines T are provided for each of the element lines LN. Inaddition, the signal lines S are provided for each of the elementcolumns CL. That is, one of the element lines LN corresponds to one ofthe scanning lines T and one of the element columns CL corresponds toone of the signal line S. As a result, below, in a case where nselection lines T are individually identified, the notation of selectionline T (i) is used. In addition, in a case where m signal lines S areindividually identified, the notation of signal line S (j) is used.

In the present embodiment, the detecting element 31 has a capacitor 37.For each of the element lines LN, one of the electrodes of the capacitor37 is electrically connected to the corresponding selection line T. Inaddition, for each of the element columns CL, the other electrode of thecapacitor 37 is electrically connected to the corresponding signal lineS. As a result, it may also be considered that the detecting elements 31are provided to correspond to intersections between the selection linesT and the signal lines S.

The selection circuit 21 which is shown in FIG. 2 is electricallyconnected to each of the selection lines T of the imaging device 19. Theselection circuit 21 sequentially outputs selection signals one at atime with regard to the n selection lines T (a selection process). Dueto this, in the imaging device 19, the n element lines LN aresequentially selected one at a time.

The read out circuit 23 is electrically connected to each of the signallines S of the imaging device 19. The read out circuit 23 reads out thedetection signal in units of the element lines LN which are selectedfrom the plurality of detecting elements 31 via the m signal lines S (areading out process). In the detection signals, signal values arereflected according to the amount of light of the infrared rays which isdetected by the detecting elements 31.

The A/D conversion section 25 is electrically connected to the read outcircuit 23. The A/D conversion section 25 converts analog data on thedetecting signals which are read out by the read out circuit 23 to imagedata VD of digital data and outputs the image data VD (an A/D conversionprocess).

The control circuit 27 individually controls driving of each of theselection circuit 21, the read out circuit 23, and the A/D conversionsection 25. The selection process, read out process and A/D conversionprocess are controlled by the control circuit 27.

As shown in FIG. 4 which is a planar diagram, the detecting elements 31are provided in an element substrate 51.

As shown in FIG. 5 which is a cross sectional diagram along the line A-Ain FIG. 4, the element substrate 51 has a substrate 53, an intermediatelayer 55, a protective layer 57, a protective layer 59, and a supportlayer 61.

For example, the substrate 53 is configured of glass, quartz, silicon,or the like, and has a first surface 53 a which is a surface which facestoward the detecting element 31 side and a second surface 53 b which isa surface which faces toward the opposite side to the first surface 53a. In the present embodiment, silicon is adopted as the material of thesubstrate 53. Below, the first surface 53 a side of the substrate 53 isreferred to as the upper side and the second surface 53 b side of thesubstrate 53 is referred to as the lower side.

The intermediate layer 55 is provided on the first surface 53 a of thesubstrate 53. A concave portion 56 which is concave toward the firstsurface 53 a side (the lower side) is provided on the opposite side (theupper side) to the first surface 53 a side in the intermediate layer 55.For example, it is possible for silicon oxide, silicon nitride, or thelike to be adopted as the material of the intermediate layer 55. In thepresent embodiment, silicon oxide is adopted as the material of theintermediate layer 55.

The protective layer 57 is provided on the intermediate layer 55 on theopposite side to the substrate 53 side. The protective layer 57 includesthe concave portion 56 and covers the intermediate layer 55 on theopposite side to the substrate 53 side.

The protective layer 59 is provided on the protective layer 57 on theopposite side to the intermediate layer 55. In the concave portion 56,the protective layer 59 is separated from the protective layer 57. Inthe concave portion 56, a hollow space portion 63 is formed between theprotective layer 57 and the protective layer 59.

As the materials of each of the protective layer 57 and the protectivelayer 59, it is possible to adopt platinum, aluminum, aluminum oxide,nickel, tungsten, molybdenum, iron, or the like, or an alloy whichincludes at least one of these as a component. In the presentembodiment, aluminum oxide is adopted as the material of each of theprotective layer 57 and the protective layer 59.

The support layer 61 is provided on the protective layer 59 on theopposite side to the protective layer 57 side. For example, it ispossible for silicon oxide, silicon nitride, or the like to be adoptedas the material of the support layer 61. In the present embodiment, aconfiguration where a layer of silicon oxide and a layer of siliconnitride are laminated is adopted as the support layer 61.

The detecting elements 31 are provided on the support layer 61 on theopposite side to the protective layer 59 side. The detecting elements 31are provided in the region which overlaps with the hollow space portion63 in a planar view on the support layer 61 on the opposite side to theprotective layer 59 side.

As shown in FIG. 6 which is an enlarged diagram of a B portion in FIG.5, the detecting elements 31 have the capacitor 37, a protective film72, an insulating film 73, a first wiring 75, a second wiring 77, aprotective film 79, and an absorbing layer 81.

The capacitor 37 is provided on the upper side of the support layer 61,and has a first electrode 85, a pyroelectric body 87, and a secondelectrode 89.

The first electrode 85 is provided on the upper side of the supportlayer 61. The pyroelectric body 87 is provided on the first electrode 85on the opposite side to the support layer 61, that is, the upper side ofthe first electrode 85. The second electrode 89 is provided on thepyroelectric body 87 on the opposite side to the first electrode 85,that is, the upper side of the pyroelectric body 87.

In the present embodiment, as each of the first electrode 85 and thesecond electrode 89, a configuration is adopted where iridium, iridiumoxide, and platinum are laminated in this order.

In addition, it is possible to adopt lead zirconate titanate (PZT), PZTNwhere niobium (Nb) is added to PZT, or the like as the material of thepyroelectric body 87.

The protective film 72 is provided on the capacitor 37 on the oppositeside to the support layer 61 side, that is, the upper side of thecapacitor 37. The protective film 72 covers the capacitor 37 from theupper side. As the material of the protective film 72, for example, itis possible to adopt platinum, aluminum, aluminum oxide, nickel,tungsten, molybdenum, iron, or the like, or an alloy which includes atleast one of these as a component. In the present embodiment, aluminumoxide (alumina) is adopted as the material of the protective film 72.

The insulating film 73 is provided on the protective film 72 on theopposite side to the support layer 61 side, that is, the upper side ofthe protective film 72. The insulating film 73 covers the protectivefilm 72 from the upper side. For example, it is possible for siliconoxide, silicon nitride, or the like to be adopted as the material of theinsulating film 73.

A contact hole 74 a is provided in the protective film 72 and theinsulating film 73 at a site which overlaps with the first electrode 85.In addition, a contact hole 74 b is provided in the insulating film 73at a site which overlaps with the second electrode 89.

The first wiring 75 and the second wiring 77 are each provided on theprotective film 72 on the opposite side to the capacitor 37 side, thatis, the upper side of the protective film 72. The first wiring 75 iselectrically connected to the first electrode 85 through the contacthole 74 a. The second wiring 77 is electrically connected to the secondelectrode 89 through the contact hole 74 b. Here, it is possible toadopt a metal such as aluminum as the material of each of the firstwiring 75 and the second wiring 77.

The protective film 79 is provided on the upper side of the first wiring75 and the second wiring 77 and covers the first wiring 75, the secondwiring 77, and the capacitor 37 from the upper side. As the material ofthe protective film 79, for example, it is possible to adopt platinum,aluminum, aluminum oxide, nickel, tungsten, molybdenum, iron, or thelike, or an alloy which includes at least one of these as a component.In the present embodiment, aluminum oxide is adopted as the material ofthe protective film 79.

The absorbing layer 81 is provided in a region, which overlaps with thecapacitor 37 in a planar view, in the upper side of the protective film79. The absorbing layer 81 has a function where infrared rays, which areincident to the detecting elements 31 from the upper side of thedetecting elements 31, are absorbed. In addition to an inorganicmaterial such as silicon oxide and silicon nitride, it is possible toadopt metal materials such as oxides or nitrides of aluminum, titaniumaluminum, or the like, organic materials to which carbon black,graphite, infrared ray absorbing dyes, or the like are added, or thelike, as the material of the absorbing layer 81. Examples of theinfrared ray absorbing dyes include anthraquinone based dyes, dithiolnickel complex based dyes, cyanine based dyes, azo cobalt complex baseddyes, diimmonium based dyes, squarylium based dyes, phthalocyanine baseddyes, naphthalocyanine based dyes, or the like. In the presentembodiment, a resin material which contains carbon black is adopted asthe material of the absorbing layer 81.

As shown in FIG. 5, the first wiring 75 extends from the region whichoverlaps with the concave portion 56 to the outside of the region whichoverlaps with the concave portion 56. The second wiring 77 also extendsfrom the region which overlaps with the concave portion 56 to theoutside of the region which overlaps with the concave portion 56.

A plurality of via wirings 91 are provided in the imaging device 19. Inthe present embodiment, two via wirings 91 are provided with regard toone of the detecting elements 31. Below, in a case where the two viawirings 91 which correspond to one of the detecting elements 31 are eachidentified, the two via wirings 91 are respectively given notation as avia wiring 91 a and a via wiring 91 b.

The via wiring 91 a is electrically connected to the first electrode 85through the first wiring 75. The via wiring 91 b is electricallyconnected to the second electrode 89 through the second wiring 77.

The via wiring 91 a is provided to the outside of the region whichoverlaps with the concave portion 56 in a planar view and penetrates theelement substrate 51 from the support layer 61 to the second surface 53b of the substrate 53. In addition, the via wiring 91 b is provided tothe outside of the region which overlaps with the concave portion 56 ina planar view and penetrates the element substrate 51 from the supportlayer 61 to the second surface 53 b of the substrate 53.

Here, as shown in FIG. 4, the detecting elements 31 are provided in anisland section 118 which is supported by beams 117. An opening section119 is provided outside the island section 118 in a region whichoverlaps with the concave portion 56 (FIG. 5). The opening section 119is linked to the hollow space portion 63 (FIG. 5).

As shown in FIG. 7 which is a cross sectional diagram along the line C-Cin FIG. 4, the first wiring 75 passes through the upper side of one ofthe beams 117 and extends from the region which overlaps with theconcave portion 56 to the outside of the region which overlaps with theconcave portion 56. In the same manner, the second wiring 77 also passesthrough the upper side of another of the beams 117 and extends from theregion which overlaps with the concave portion 56 to the outside of theregion which overlaps with the concave portion 56.

In the detecting elements 31 which have the constituent elementsdescribed above, the absorbing layer 81 absorbs infrared rays which areirradiated from the upper side of the detecting elements 31. Theabsorbing layer 81 which absorbs the infrared rays emits heat accordingto the amount of infrared rays which are absorbed. The heat which isemitted by the absorbing layer 81 is transmitted to the capacitor 37.

In the capacitor 37, the electrical characteristics change according tothe heat which is transmitted. According to the change of the electricalcharacteristics, it is possible to detect the amount of infrared rays.In the present embodiment, the amount of polarization of thepyroelectric body 87 in the capacitor 37 changes. That is, in thepresent embodiment, it is possible to detect the amount of infrared raysaccording to changes in the amount of polarization of the pyroelectricbody 87 which is one example of an electrical characteristic.

A method for manufacturing the imaging device 19 will be described.

In the method for manufacturing the imaging device 19, first, as shownin FIG. 8A, an intermediate layer 55 a is formed on the first surface 53a of the substrate 53. It is possible to form the intermediate layer 55a by forming a film of silicon oxide using a CVD (Chemical VaporDeposition) method.

Next, as shown in FIG. 8B, the concave portion 56 is formed at theintermediate layer 55 a on the opposite side to the substrate 53 side.Due to this, it is possible to form the intermediate layer 55 from theintermediate layer 55 a. It is possible to form the concave portion 56by using a photolithography method or an etching method.

Next, as shown in FIG. 8C, the protective layer 57 is formed on theintermediate layer 55 on the opposite side to the substrate 53 side,that is, the upper side of the intermediate layer 55. It is possible toform the protective layer 57 by forming a film of aluminum oxide using aCVD method, a sputtering method, or the like.

Next, as shown in FIG. 8D, a sacrificial layer 127 is formed on theprotective layer 57 on the opposite side to the intermediate layer 55side, that is, the upper side of the protective layer 57. It is possibleto form the sacrificial layer 127 by forming a film of silicon oxideusing a CVD method. At this time, the concave portion 56 is filled inwith the sacrificial layer 127. In addition, the sacrificial layer 127is formed to a thickness which is greater than the depth of the concaveportion 56.

Next, as shown in FIG. 9A, in the sacrificial layer 127, a sacrificiallayer 127 a in the concave portion 56 is left and another site 127 b ofthe sacrificial layer 127 is removed using a CMP (Chemical MechanicalPolishing) method.

Next, as shown in FIG. 9B, the protective layer 59 is formed on theprotective layer 57 on the opposite side to the substrate 53 side, thatis, the upper side of the protective layer 57. It is possible to formthe protective layer 59 by forming a film of aluminum oxide using a CVDmethod, a sputtering method, or the like.

Next, as shown in FIG. 9C, a support layer 61 a is formed on theprotective layer 59 on the opposite side to the substrate 53 side, thatis, the upper side of the protective layer 59. It is possible to formthe support layer 61 a by forming a film where a layer of silicon oxideand a layer of silicon nitride are laminated using a CVD method.

Next, as shown in FIG. 9D, a via hole 129 a and a via hole 129 b areformed at the outside of the region which overlaps with the concaveportion 56 in a planar view. The via hole 129 a and the via hole 129 beach penetrate from the support layer 61 a to the second surface 53 b ofthe substrate 53. It is possible to form each of the via hole 129 a andthe via hole 129 b by using a photolithography method or an etchingmethod.

Next, an insulating film which is not shown in the diagram is formed bysilicon oxide, silicon nitride, or the like using a CVD method on eachof the side surfaces of the inner sides of the via hole 129 a and thevia hole 129 b

Next, the via wiring 91 a and the via wiring 91 b are respectivelyformed by filling metal such as aluminum into the via hole 129 a and thevia hole 129 b.

Next, a pad 93 a and a pad 93 b are formed on the second surface 53 b ofthe substrate 53. It is possible to form each of the pad 93 a and thepad 93 b by using a sputtering method, a photolithography method, or anetching method.

Next, as shown in FIG. 10A, the capacitor 37 is formed on the upper sideof the support layer 61 a.

In the forming of the capacitor 37, first, a metal film which configuresthe first electrode 85 is formed on the upper side of the support layer61 a using a sputtering method.

Next, a film is formed by applying and heating a substance which isformed of the material of the pyroelectric body 87 on the upper side ofthe first electrode 85.

Next, a metal film which configures the second electrode 89 is formed onthe upper side of the film which is formed with the material of thepyroelectric body 87 using a sputtering method.

Next, the film which is formed of the material of the pyroelectric body87 and the metal film which configures the second electrode 89 which isformed on the upper side of the film are patterned using aphotolithography method or an etching method. Due to this, thepyroelectric body 87 and the second electrode 89 are formed. Next, it ispossible to form the first electrode 85 by patterning the metal filmwhich configures the first electrode 85 using a photolithography methodor an etching method. According to the description above, it is possibleto form the capacitor 37.

Next, as shown in FIG. 10B, the protective film 72 is formed on theupper side of the capacitor 37. It is possible to form the protectivefilm 72 by forming a film of aluminum oxide which covers the capacitor37 using a CVD method, a sputtering method, or the like and thenpatterning the film of aluminum oxide using a photolithography methodand an etching method.

Next, the insulating film 73 is formed on the upper side of theprotective film 72. It is possible to form the insulating film 73 byforming a film which covers the protective film 72 using the CVD methodand then patterning the film using a photolithography method or anetching method.

Next, as shown in FIG. 10C, the contact hole 74 a and the contact hole74 b are formed in the protective film 72 and the insulating film 73. Itis possible to form each of the contact hole 74 a and the contact hole74 b using a photolithography method or an etching method.

Next, as shown in FIG. 11A, the first wiring 75 and the second wiring 77are formed. It is possible to form the first wiring 75 and the secondwiring 77 by forming a metal film using a sputtering method and thenpatterning the metal film using a photolithography method or an etchingmethod.

Next, as shown in FIG. 11B, the opening section 119 is formed in thesupport layer 61 a. Here, FIG. 11B corresponds to a cross section alongline C-C in FIG. 4. Due to this, the opening section 119 and the beams117 are formed and the support layer 61 is formed from the support layer61 a. It is possible to form the opening section 119 by using aphotolithography method or an etching method.

Next, as shown in FIG. 11C, the protective film 79 which covers thefirst wiring 75, the second wiring 77 and the capacitor 37 is formed onthe upper side of the first wiring 75 and the second wiring 77. It ispossible to form the protective film 79 by forming a film of aluminumoxide using a CVD method, a sputtering method, or the like and thenpatterning the film of aluminum oxide using a photolithography method oran etching method.

Next, the sacrificial layer 127 a (FIG. 11C) inside the concave portion56 is removed. Due to this, it is possible to form the hollow spaceportion 63. It is possible to remove the sacrificial layer 127 a byusing a photolithography method or an etching method.

Next, the absorbing layer 81 is formed on the upper side of theprotective film 79 in the region which overlaps with the capacitor 37 ina planar view.

In the forming of the absorbing layer 81, first, as shown in FIG. 12, aliquid body 81 a which contains the material of the absorbing layer 81is applied on the upper side of the protective film 79. In the applyingof the liquid body 81 a, it is possible to use an ink jet method where adischarging head 141 is used.

A technique, where the liquid body 81 a is discharged from thedischarging head 141 as liquid droplets 81 b, is referred to as an inkjet technique. Then, a method where the liquid body 81 a or the like isarranged in a predetermined position using the ink jet technique isreferred to as an ink jet method. The ink jet method is an applyingmethod.

In the present embodiment, the liquid body 81 a contains the material ofthe absorbing layer 81, a resin material, and a solvent. As the resinmaterial, for example, it is possible to adopt a material which is curedby applying energy such as light or heat.

Following the applying of the liquid body 81 a, the liquid body 81 a iscured by applying energy such as light or heat to the liquid body 81 a.Due to this, it is possible to form the absorbing layer 81 which isshown in FIG. 6. According to the description above, it is possible tomanufacture the imaging device 19 which is shown in FIG. 5.

Here, it is possible for it to be easy to increase the height of theliquid body 81 a in the upper side of the protective film 79 by carryingout a liquid repellent treatment on the upper side of the protectivefilm 79 before the liquid body 81 a is applied on the upper side of theprotective film 79. Here, the liquid repellent treatment is a treatmentof increasing the liquid repellency with regard to the liquid body 81 a.Since it is possible to increase the height of the liquid body 81 a inthe upper side of the protective film 79 by performing the liquidrepellent treatment, it is possible to increase the thickness of theabsorbing layer 81. Due to this, it is possible for it to be easy toincrease the absorption rate of the electromagnetic waves in theabsorbing layer 81.

In the present embodiment, the absorbing layer 81 corresponds to theabsorbing section, the capacitor 37 corresponds to the detectingsection, and the protective film 79 corresponds to the protective film.

In the present embodiment, since the absorbing layer 81 is formed afterforming the hollow space portion 63, it is possible to avoid damagingthe absorbing layer 81 in the forming of the hollow space portion 63. Asa result, it is possible to omit the film, which protects the absorbinglayer 81, in the detecting elements 31. As a result, it is possible forit to be easy to improve the productivity and reliability of thedetecting elements 31.

Driving Support Device

A driving support device which is one example of an electronic devicewhich uses the camera 1 will be described.

As shown in FIG. 13 which is a block diagram which shows the mainconstituent elements, a driving support device 400 in the presentembodiment has a processing unit 211, the camera 1, a yaw rate sensor213, a vehicle speed sensor 215, a brake sensor 217, a speaker 219, anda display device 221.

The processing unit 211 has a CPU (Central Processing Unit) whichcontrols the driving support device 400.

The camera 1 detects infrared rays in a predetermined imaging regionoutside the vehicle.

The yaw rate sensor 213 detects the yaw rate of the vehicle.

The vehicle speed sensor 215 detects the running speed of the vehicle.

The brake sensor 217 detects the presence or absence of a brakeoperation by a driver.

For example, the processing unit 211 detects targets such as objects,pedestrians, and the like which exist in the periphery of the vehicle,based on an infrared image of the surroundings of the vehicle which isobtained by the imaging of the camera 1. Then, based on the detectionresult of the target and the detection signal according to the runningstate of the vehicle which is detected by the yaw rate sensor 213, thevehicle speed sensor 215, and the brake sensor 217, a warning is outputthrough the speaker 219 and the display device 221 when it is determinedthat there is a possibility that the vehicle will come into contact withthe target.

Here, as shown in FIG. 14, the camera 1 is arranged in the vicinity ofthe center in the vehicle width direction in the front section of thevehicle 223. It is possible for the display device 221 to adopt aconfiguration which has an HUD (Head Up Display) 225 or the like whichdisplays various types of information in a position in the front windowwhich does not interfere with the forward visibility of the driver.

Security Device

A security device which is one example of an electronic device whichuses the camera 1 will be described.

As shown in FIG. 15 which is a block diagram which shows the mainconstituent elements, a security device 410 in the present embodimenthas the camera 1, a motion sensor 231 (human detection sensor), amovement detection processing section 233, a motion sensor detectionprocessing section 235, an image compression section 237, acommunication processing section 239, and a control section 241.

The camera 1 images a monitoring area.

The motion sensor 231 detects an intruder entering into the monitoringarea.

The movement detection processing section 233 detects a moving objectwhich has entered into the monitoring area by processing the image datawhich is output from the camera 1.

The motion sensor detection processing section 235 performs a detectionprocess of the motion sensor 231.

The image compression section 237 compresses the image data which isoutput from the camera 1 using a predetermined method.

The communication processing section 239 performs transmission of imagedata which has been compressed, intruder detection image data and thelike, and reception of various types of information and the like fromexternal devices to the security device 410.

The control section 241 has a CPU which performs the setting ofconditions, the process command transmission, and the responseprocessing with regard to each of the processing sections of thesecurity device 410.

The movement detection processing section 233 is provided with a buffermemory which is not shown in the diagram, a block data smoothing sectionwhere the output from the buffer memory is input, and a state changedetecting section where the output from the block data smoothing sectionis input. Then, the state change detecting section of the movementdetection processing section 233 detects changes in the state by usingthat differences are generated in the image data between frames whenthere is a change in state (a moving object enters) while image data isthe same even in different frames which are imaged using video if themonitoring area is in a stationary state.

As shown in FIG. 16, the camera 1 and the motion sensor 231 are providedin the security device 410 under an eave. Then, the camera 1 images amonitoring area 243 and the motion sensor 231 detects an intruder into adetection area 245.

Game Device

A game device which is one example of an electronic device which usesthe camera 1 will be described.

As shown in FIG. 17, a game device 420 in the present embodiment has acontroller 251, a body 253, a display 255, an LED module 257, and an LEDmodule 258. With the game device 420, it is possible for a player 259 toplay a game by gripping the controller 251 in one hand.

As shown in FIG. 18, the controller 251 has an imaging informationcalculation unit 261, an operation switch 263, an acceleration sensor265, a connector 267, a processor 269, and a wireless module 271.

The imaging information calculation unit 261 has the camera 1, and animage processing circuit 273 for processing image data which was imagedby the camera 1.

The image processing circuit 273 detects a portion with a highbrightness by processing infrared image data which was obtained from thecamera 1, detects the center positions and the areas thereof, andoutputs the data.

The processor 269 outputs operation data from the operation switch 263,acceleration data from the acceleration sensor 265, and high brightnessportion data as a series of control data. The wireless module 271modulates the carrier wave of a predetermined frequency using controldata, and outputs the result as a radio signal from an antenna 275.

Here, data which is input through the connector 267 which is provided inthe controller 251 is also processed in the same manner as the datadescribed above by the processor 269, and is output as control datathrough the wireless module 271 and the antenna 275.

In the game device 420, when the camera 1 of the controller 251 faces ascreen 277 of the display 255, the camera 1 detects infrared rays whichare output from two of the LED module 257 and the LED module 258 whichare arranged in the vicinity of the display 255. Then, the controller251 acquires the positions and area information of the two of the LEDmodule 257 and the LED module 258 as information of points of highbrightness. The data on the positions and the sizes of the bright pointsare transmitted to the body 253 from the controller 251 in a wirelessmanner and received by the body 253. When the player 259 moves thecontroller 251, the data on the positions and sizes of the bright pointschanges. Using the above, it is possible for the body 253 to acquire anoperation signal which corresponds to the movement of the controller251. Then, it is possible for the game device 420 to proceed with thegame according to the operation signal.

Body Temperature Measurement Device

A body temperature measurement device which is one example of anelectronic device which uses the camera 1 will be described.

As shown in FIG. 19, a body temperature measurement device 430 in thepresent embodiment has the camera 1, a body temperature analyzing device281, an information communication device 283, and a cable 285.

The camera 1 images a predetermined target region and transmits imageinformation of a target person 287 who has been imaged to the bodytemperature analyzing device 281 through the cable 285.

The body temperature analyzing device 281 includes an image reading outand processing unit 288 and a body temperature analysis processing unit289. The image reading out and processing unit 288 reads a heatdistribution image from the camera 1. The body temperature analysisprocessing unit 289 forms a body temperature analysis table based on thedata from the image reading out and processing unit 288 and an imageanalysis setting table.

The body temperature analysis processing unit 289 transmits data forbody temperature information transmission based on the body temperatureanalysis table to the information communication device 283. The data forbody temperature information transmission may include predetermined datawhich corresponds to abnormal body temperatures. In addition, in a casewhere it is determined that a plurality of target persons 287 areincluded within the target region, information of the number of targetpersons 287 and the number of persons with abnormal body temperaturesmay be included in the data for body temperature informationtransmission.

Specific Substance Detecting Device

A specific substance detecting device which is one example of anelectronic device which uses the camera 1 will be described.

As shown in FIG. 20, a specific substance detecting device 440 in thepresent embodiment has the camera 1, a control unit 291, a lightirradiation unit 293, an optical filter 295, and a display section 297.With the specific substance detecting device 440, the wavelength rangeof the infrared rays which are absorbed by the absorbing layer 81 of thedetecting element 31 is set in the terahertz range in the imaging device19 of the camera 1.

The control unit 291 includes a system controller which performs controlof the entirety of the specific substance detecting device 440. Thesystem controller controls a light source driving section and an imageprocessing unit which are included in the control unit 291.

The light irradiation unit 293 includes a laser device and an opticalsystem which emit terahertz light which is an electromagnetic wave wherethe wavelength is in the range of 100 μm to 1000 μm and irradiates theterahertz light to a person 298 who is the target of investigation. Theterahertz light which is reflected from the person 298 is received inthe camera 1 through the optical filter 295, where only light of aspectrum of a specific substance 299 which is a detection target, passesthrough.

The image signal which is generated by the camera 1 is subjected topredetermined image processing in an image processing unit of thecontrol unit 291, and the image signal is output to the display section297. Then, since the intensity of the received light signal is differentaccording to whether or not the specific substance 299 exists within theclothes or the like of the person 298, it is possible to distinguish theexistence of the specific substance 299.

GENERAL INTERPRETATION OF TERMS

In understanding the scope of the present invention, the term“comprising” and its derivatives, as used herein, are intended to beopen ended terms that specify the presence of the stated features,elements, components, groups, integers, and/or steps, but do not excludethe presence of other unstated features, elements, components, groups,integers and/or steps. The foregoing also applies to words havingsimilar meanings such as the terms, “including”, “having” and theirderivatives. Also, the terms “part,” “section,” “portion,” “member” or“element” when used in the singular can have the dual meaning of asingle part or a plurality of parts. Finally, terms of degree such as“substantially”, “about” and “approximately” as used herein mean areasonable amount of deviation of the modified term such that the endresult is not significantly changed. For example, these terms can beconstrued as including a deviation of at least ±5% of the modified termif this deviation would not negate the meaning of the word it modifies.

While only selected embodiments have been chosen to illustrate thepresent invention, it will be apparent to those skilled in the art fromthis disclosure that various changes and modifications can be madeherein without departing from the scope of the invention as defined inthe appended claims. Furthermore, the foregoing descriptions of theembodiments according to the present invention are provided forillustration only, and not for the purpose of limiting the invention asdefined by the appended claims and their equivalents.

What is claimed is:
 1. A method for manufacturing a detecting element,which has an absorbing section where a temperature rises according to anamount of electromagnetic waves which are absorbed and a detectingsection where characteristics change according to an amount of heatwhich is transmitted from the absorbing section, the method comprising:forming the detecting section on a substrate; forming a protective filmwhich covers the detecting section; forming a hollow space portion in aregion which overlaps with the detecting section of the substrate in aplanar view after the forming of the protective film; and forming theabsorbing section by applying a liquid body, which contains a materialconstituting the absorbing section, in a region on the protective filmon an opposite side from the detection section, which overlaps with thedetecting section in a planar view, and solidifying the liquid bodyafter the forming of the hollow space portion.
 2. The method formanufacturing the detecting element according to claim 1, wherein theforming of the absorbing section includes applying the liquid body bydischarging the liquid body as liquid droplets.
 3. The method formanufacturing the detecting element according to claim 1, wherein theforming of the detecting section includes forming a first electrode onthe substrate, forming a pyroelectric body on the first electrode on anopposite side from the substrate, and forming a second electrode on thepyroelectric body on an opposite side from the first electrode.
 4. Themethod for manufacturing the detecting element according to claim 1,further comprising forming a sacrificial layer on the substrate beforethe forming of the detecting section, wherein the forming of thedetecting section includes forming the detecting section in a regionwhich overlaps with the sacrificial layer of the substrate in a planarview, and the forming of the hollow space portion includes forming thehollow space portion by removing the sacrificial layer.
 5. The methodfor manufacturing the detecting element according to claim 4, whereinthe forming of the hollow space portion includes forming a hole whichreaches the sacrificial layer in the surroundings of the detectingsection, and supplying an etchant from the hole and removing thesacrificial layer.
 6. A method for manufacturing an imaging device,comprising arranging a plurality of the detecting elements in bi-axialdirections using the method for manufacturing the detecting elementaccording to claim 1.